ICP3 Ion etching system FIRST ETH Zurich

Awarded to

3 awards in this register

Reasons given by the contracting authority

Die Zuschlagsempfängerin hat die höchste Punktzahl aller eingereichten Angebote erzielt. Insbesondere bei den Lebenszykluskosten wie Unterhaltskosten und Energieverbrauch war ihr Angebot das beste.

Description

Delivery of a reactive ion etching system with inductively coupled plasma, consisting of a gas supply system for at least 9 gases, with process pressure up to 100 mtorr and gas flows up to 500 sccm, RF/ICP generators in the kW range with autotuning, spectroscopic monitoring of the plasma, automatic loading lock for fast loading, for sample sizes from 4 inch diameter, with sample temperature control in the range from 10 to 300 °C.

Official publication: project 4823 on simap.ch. Only the version published there is authoritative.

Contracting authority	ETH Zürich - Abt. Procurement & Export Services
Location	Zürich ETH Hönggerberg
Canton	Zurich
Contract type	Supply contract
CPV	38000000 Laboratory, optical and precision equipments (excl. glasses)
Covered by international treaties	Yes

Contracting authority

ETH Zürich - Abt. Procurement & Export Services

Location

Zürich ETH Hönggerberg

Canton

Zurich

Contract type

Supply contract

CPV

38000000
Laboratory, optical and precision equipments (excl. glasses)

Covered by international treaties

Yes