Open for bids
Ultra-high Resolution Electron-beam Lithography System
- Publication no.
- 45007-01
- Published on
- Procedure
- Open procedure
Submission deadline
Description
The B & R Nanotechnology Center (BRNC) at ETH Zurich invites tenders for the purchase of one (1) ultra-high resolution electron-beam lithography (EBL) system. The system will be used for a variety of research activities of internal and external users, ranging from the generation of high-precision structures at the nanometer level to the rapid exposure of complex structures over large areas. The scope includes delivery, installation, training and acceptance of the system.
Official publication: project 45007 on simap.ch. Only the version published there is authoritative.
Details
| Contracting authority | ETH Zürich - Abt. Procurement & Export Services |
|---|---|
| Location | Rüschlikon |
| Canton | Zurich |
| Contract type | Supply contract |
| CPV | 38000000 Laboratory, optical and precision equipments (excl. glasses) |
| Covered by international treaties | Yes |