Contract awarded
Thin Film Cluster Deposition System for Sputtering of Metals and Dielectrics
- Publication no.
- 7527-02
- Published on
- Procedure
- Open procedure
CHF 2,870,055Awarded amountabout CHF 2.9m
6bids received
Awarded to
Evatec AG
Preis inklusive der Option HiPIMS.
Reasons given by the contracting authority
Die Zuschlagsempfängerin hat die höchste Gesamtpunktzahl erreicht und konnte insbesondere in den vorteilhafteren Lebenszykluskosten und in der höheren technischen Reife der angebotenen Lösung überzeugen.
Description
Thin-film cluster coating system for sputtering metals and dielectrics Cluster system with an airlock and 4 process chambers (PCs) for DC and RF sputtering of dielectrics and metals on semiconductors and other substrates. Please refer to our specification for details.
Official publication: project 7527 on simap.ch. Only the version published there is authoritative.
Details
| Contracting authority | ETH Zürich - Abt. Procurement & Export Services |
|---|---|
| Location | Rüschlikon |
| Canton | Zurich |
| Contract type | Supply contract |
| CPV | 38000000 Laboratory, optical and precision equipments (excl. glasses) |
| Covered by international treaties | Yes |